Connect 3-phase power. Ensure proper grounding.
The ASTRON 2L contains specialized wetted materials designed to withstand fluorine radical erosion. Over time, the internal dielectric lining wears thin, leading to aluminum contamination in the process chamber or plasma unstable behavior.
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If rack-mounting, secure the chassis using standard industrial brackets.
(nitrogen trifluoride) dissociation to generate atomic fluorine for chamber cleaning. DatasheetArchive mks astron 2l manual
Automatically protects the internal circuitry and connected loads from overcurrent and short-circuit conditions.
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Check for gas purity issues; inspect the internal chamber coating for degradation.
Proper physical integration prevents plasma instability and premature hardware failure. Gas Delivery Connection Connect 3-phase power
| Feature | MKS Astron 2L | MKS Astron 2L Remote Plasma Source (RPS) | | :--- | :--- | :--- | | Primary Function | A linear, regulated DC power supply for benchtop and system integration. | A reactive gas generator for cleaning semiconductor process chambers. | | Typical Use | Powering electronic circuits, laboratory testing, and general R&D. | Cleaning CVD (Chemical Vapor Deposition) and etch chambers in semiconductor fabs. | | Key Specifications (Varies by model) | Typically dual-output (e.g., 0-32VDC, up to 500W). | Typically requires 208VAC 3-phase input, water-cooled. | | Common Model Numbers | ASTEX Astron 2L. | AX7687-85, AX7657-85. |
| Pin | Signal | Description | |-----|--------|-------------| | 1 | HV Return | High voltage return | | 2 | Case Ground | Chassis ground | | 3 | HV Out | -3.5 kV to -5 kV to gauge | | 4 | Current In | Gauge current signal | | 5 | NC | Not connected | | 6 | Shield | Cable shield | | 7 | +24V In | Power input (if using DC) | | 8 | Power Return | Ground for power | | 9 | NC | Not connected |
Use only facility water that meets the minimum resistivity requirements (often
. This "remote" method is widely preferred in industry because it reduces damage to the expensive components inside the main CVD chamber compared to in-situ cleaning MKS Instruments Key Technical Specifications Model Number AX7651-2 (ASTRON 2L) Approximately 52 kg (115 lbs) Primary Use Chamber cleaning and reactive gas production MKS Instruments Cleaning Agent Typically Nitrogen Trifluoride ( cap N cap F sub 3 Over time, the internal dielectric lining wears thin,
Evacuate the process chamber and the ASTRON 2L internal block to base vacuum. The outlet pressure must stabilize within the range before attempting a strike. Step 2: Plasma Striking (Ignition) Flow pure Argon (
. It is known for significantly extending the service life of CVD chambers, though the plasma source itself is a consumable component with a finite lifetime due to internal surface damage over time MKS Instruments
While the official manual is essential, here is a general overview of common features for the :